Dynamic properties of interstitial carbon and carbon-carbon pair defects in silicon

被引:52
作者
Leary, P
Jones, R
Oberg, S
Torres, VJB
机构
[1] UNIV LULEA,DEPT MATH,S-97187 LULEA,SWEDEN
[2] UNIV AVEIRO,DEPT FIS,P-3810 AVEIRO,PORTUGAL
来源
PHYSICAL REVIEW B | 1997年 / 55卷 / 04期
关键词
D O I
10.1103/PhysRevB.55.2188
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Interstitial carbon, C-i, defects in Si exhibit a number of unexplained features. The C-1 defect in the neutral charge state gives rise to two almost degenerate vibrational modes at 920 and 931 cm(-1) whose 2:1 absorption intensity ratio naturally suggests a trigonal defect in conflict with uniaxial stress measurements. The dicarbon, C-s-C-i, defect is bistable, and the energy difference between its A and B forms is surprisingly small even though the bonding is very different. In the B form appropriate to the neutral charge state, a silicon interstitial is believed to be located near a bond-centered site between two C-s atoms. This must give rise to vibrational modes which involve the motion of both C atoms in apparent conflict with the results of photoluminescence experiments. We use an nb initio local density functional cluster method, AIMPRO, to calculate the structure and vibrational modes of these defects and find that the ratio of the absorption intensities of the local modes of C-i is in reasonable agreement with experiment even though the structure of the defect is not trigonal. We also show that modes in the vicinity of those detected by photoluminescence for the B form of the dicarbon center involve independent movements of the two C atoms. Finally, the trends in the relative energies of the A and B forms in three charge states are investigated.
引用
收藏
页码:2188 / 2194
页数:7
相关论文
共 27 条
[1]   PSEUDOPOTENTIALS THAT WORK - FROM H TO PU [J].
BACHELET, GB ;
HAMANN, DR ;
SCHLUTER, M .
PHYSICAL REVIEW B, 1982, 26 (08) :4199-4228
[2]  
Bean A. R., 1970, Solid State Communications, V8, P175, DOI 10.1016/0038-1098(70)90074-8
[3]   ELECTRONIC-STRUCTURE OF INTERSTITIAL CARBON IN SILICON [J].
BESSON, M ;
DELEO, GG .
PHYSICAL REVIEW B, 1991, 43 (05) :4028-4033
[4]   INTERSTITIAL CARBON AND THE CARBON-CARBON PAIR IN SILICON - SEMIEMPIRICAL ELECTRONIC-STRUCTURE CALCULATIONS [J].
BURNARD, MJ ;
DELEO, GG .
PHYSICAL REVIEW B, 1993, 47 (16) :10217-10225
[5]   IDENTIFICATION OF THE MIGRATION PATH OF INTERSTITIAL CARBON IN SILICON [J].
CAPAZ, RB ;
DALPINO, A ;
JOANNOPOULOS, JD .
PHYSICAL REVIEW B, 1994, 50 (11) :7439-7442
[6]  
Davies G, 1994, Handbook on semiconductors, V3b, P1557, DOI DOI 10.1002/CVDE.19960020108
[7]  
DAVIES G, 1981, J PHYS C SOLID STATE, V14, P1687
[8]   TRANSIENT CAPACITANCE STUDIES OF AN ELECTRON TRAP AT EC-ET=0.105EV IN PHOSPHORUS-DOPED SILICON [J].
JELLISON, GE .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (08) :5715-5719
[9]   AB-INITIO CALCULATIONS OF ANHARMONICITY OF THE C-H STRETCH MODE IN HCN AND GAAS [J].
JONES, R ;
GOSS, J ;
EWELS, C ;
OBERG, S .
PHYSICAL REVIEW B, 1994, 50 (12) :8378-8388
[10]   Peculiarities of interstitial carbon and di-carbon defects in Si [J].
Jones, R ;
Oberg, S ;
Leary, P ;
Torres, V .
ICDS-18 - PROCEEDINGS OF THE 18TH INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS, PTS 1-4, 1995, 196- :785-789