Broadband Antireflective Structures on PMMA by Plasma Treatment

被引：19

作者：

Leitel, Robert ^{[1
]}

Kaless, Antje ^{[2
]}

Schulz, Ulrike ^{[2
]}

Kaiser, Norbert ^{[2
]}

机构：

[1] Univ Jena, Inst Appl Phys, D-07743 Jena, Germany

[2] Fraunhofer Inst Angew Opt & Feinmech, D-07745 Jena, Germany

来源：

PLASMA PROCESSES AND POLYMERS | 2007年 / 4卷

关键词：

low-pressure discharges; optical properties; plastics; self-organization; surface morphology;

D O I：

10.1002/ppap.200732103

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Stochastic subwavelength structures on polymethylmetacrylate (PMMA) surfaces were produced by low-pressure argon/oxygen plasma treatment. The modified surfaces show antireflective properties exhibiting low scattering losses depending on the size and the density of the structure. It is demonstrated that the antireflection performance is a function of the mean ion energy and working pressure that are controllable by process parameters, namely plasma power and gas flow. A model is suggested that assumes a self-assembling etch mask as reason for the growth of the pins with about 70-90 nm in lateral dimension and up to 600 nm in height.

引用

页码：S878 / S881

页数：4

共 13 条

[1]

[Anonymous], 2003, Encyclopedia of Optical Engineering

[2]

BERNHARD CG, 1967, ENDEAVOUR, V26, P79

[3] INTERACTION OF LOW-ENERGY IONS (LESS-THAN-10 EV) WITH POLYMETHYLMETHACRYLATE DURING PLASMA TREATMENT [J].