Temperature influence on the formation of silanized monolayers on silica: An atomic force microscopy study

被引:43
作者
Davidovits, JV
Pho, V
Silberzan, P
Goldmann, M
机构
[1] INST CURIE,LAB PHYSICOCHIM SURFACES & INTERFACES,F-75231 PARIS 05,FRANCE
[2] CORNING EUROPE INC,CTR EUROPEEN RECH & TECHNOL,F-77210 AVON,FRANCE
关键词
atomic force microscopy; glass surfaces; physical adsorption; self-assembly; silane; surface structure; morphology; roughness; and topography; surface thermodynamics;
D O I
10.1016/0039-6028(95)01162-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We observed stages in the formation of self assembled n-octadecyltrichlorosilane monolayers on silicon wafers using atomic force microscopy, At low temperature, the surface is first covered by a disordered phase, comparable to the liquid expanded phase of Langmuir films, Further addition of molecules causes reorganisation into a thicker and more ordered phase, similar to the liquid condensed phase of a Langmuir film. Both phases are formed through a first order transition. At high temperature, we find only the liquid expanded phase and a very different process for the monolayer formation.
引用
收藏
页码:369 / 373
页数:5
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