Electrolytic deposition of oxide films in the presence of hydrogen peroxide

被引：66

作者：

Zhitomirsky, I ^{[1
]}

机构：

[1] Technion Israel Inst Technol, Israel Inst Met, IL-32000 Haifa, Israel

来源：

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY | 1999年 / 19卷 / 15期

关键词：

Nb2O2; PZT; TiO2; ZrO2; RuO2; electrolytic deposition;

D O I：

10.1016/S0955-2219(99)00023-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Cathodic electrosynthesis of TiO2, Nb2O5, PZT, composite RuO2-TiO2 and Al2O3-TiO2 films and powders was performed. In the proposed approach, TiO2, Nb2O5, PZT film formation on platinized silicon or/and Pt substrates was achieved via peroxoprecursors. . Obtained deposits were characterized by XRD, SEM, Auger and SIMS methods. The crystallization behaviour of the deposits has been studied. Possible cathodic reactions which underlie the deposition process and the role of hydrogen peroxide are discussed. (C) 1999 Published by Elsevier Science Limited. All rights reserved.

引用

页码：2581 / 2587

页数：7

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