Growth and properties of electrodeposited cobalt films on Pt/Si(100) surface

被引：24

作者：

Azizi, A ^{[1
]}

Sahari, A

Felloussia, ML

Schmerber, G

Mèny, C

Dinia, A

机构：

[1] Univ Setif, Lab Energet & Electrochim Solides, Setif 19000, Algeria

[2] Inst Phys & Chim Mat Strasbourg, UMR 7045, F-05067034 Strasbourg 2, France

来源：

APPLIED SURFACE SCIENCE | 2004年 / 228卷 / 1-4期

关键词：

electrodeposition; growth; Co films; structural; magnetic films;

D O I：

10.1016/j.apsusc.2004.01.026

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this paper, the growth, structural and magnetic properties of cobalt (Co) films electrodeposited on a Pt/Si(1 0 0) substrate have been investigated. Co films with metallic appearance were obtained from aqueous solution of 0.1 M CoSO4, 10 mM CoCl2 as the source of metal ions and 1 M NaSO4 as a supporting electrolyte with 0.5 M H3BO3 at pH 4.2. This electrochemical technique indicated a deposition peak signature of limited diffusion growth with the transition from progressive to instantaneous nucleation mechanism. The atomic force microscopy (AFM) images showed a granular structure of the electrodeposited layers. X-ray measurements (XRD) and nuclear magnetic resonance (NMR) indicate a small grain size with the presence of a mixture of Co hcp and fcc structures. The magnetic properties of the deposited films were investigated with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis is in the plane. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：320 / 325

页数：6

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