Quaziamorphous carbon and carbon nitride films deposited from the plasma of pulsed cathodic arc discharge

被引：10

作者：

Stanishevsky, A ^{[1
]}

机构：

[1] Univ Maryland, Inst Plasma Res, College Pk, MD 20742 USA

来源：

CHAOS SOLITONS & FRACTALS | 1999年 / 10卷 / 12期

关键词：

D O I：

10.1016/S0960-0779(98)00248-3

中图分类号：

O1 [数学];

学科分类号：

0701 ; 070101 ;

摘要：

Cathodic are discharge allows deposition of hydrogen-free quaziamorphous carbon films with a aide range of properties. The amount of sp(3)-bonded fraction can be up to 80 at.%, depending on the deposition conditions. This paper presents a summary of the characterization of carbon and carbon nitride thin films prepared by the cathodic are discharge method operating in pulsed mode. The influence of the discharge parameters on the film's structure and properties is described. Partial attention is paid to the analysis of films by Raman spectroscopy and atomic force microscopy. A comparison of results for different plasma sources design is conducted. (C) 1999 Elsevier Science Ltd. All rights reserved.

引用

页码：2045 / 2066

页数：22

共 75 条

[1] HIGH ADHESION OF DIAMOND-LIKE FILMS ACHIEVED BY THE PULSED ARC-DISCHARGE METHOD [J].

ANTTILA, A ;

SALO, J ;

LAPPALAINEN, R .

MATERIALS LETTERS, 1995, 24 (1-3) :153-156

[2] Superior attachment of high-quality hydrogen-free amorphous diamond films to solid materials [J].

Anttila, A ;

Lappalainen, R ;

Tiainen, VM ;

Hakovirta, M .

ADVANCED MATERIALS, 1997, 9 (15) :1161-&

[3] MODELING STUDIES OF AMORPHOUS-CARBON [J].

BEEMAN, D ;

SILVERMAN, J ;

LYNDS, R ;

ANDERSON, MR .

PHYSICAL REVIEW B, 1984, 30 (02) :870-875

[4] Influence of gas pressure and cathode composition on ion energy distributions in filtered cathodic vacuum arcs [J].

Bilek, MMM ;

Martin, PJ ;

McKenzie, DR .

JOURNAL OF APPLIED PHYSICS, 1998, 83 (06) :2965-2970

[5] Recent progress in filtered vacuum arc deposition [J].

Boxman, RL ;

Zhitomirsky, V ;

Alterkop, B ;

Gidalevich, E ;

Beilis, I ;

Keidar, M ;

Goldsmith, S .

SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3) :243-253

[6] CHARACTERIZATION OF A 1 KA VACUUM-ARC PLASMA GUN FOR USE AS A METAL VAPOR-DEPOSITION SOURCE [J].

BOXMAN, RL ;

GOLDSMITH, S .

SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3) :1024-1034

[7] Influence of ion energy and substrate temperature on the optical and electronic properties of tetrahedral amorphous carbon (ta-C) films [J].

Chhowalla, M ;

Robertson, J ;

Chen, CW ;

Silva, SRP ;

Davis, CA ;

Amaratunga, GAJ ;

Milne, WI .

JOURNAL OF APPLIED PHYSICS, 1997, 81 (01) :139-145

[8] Investigation of carbon nitride films by cathodic arc evaporation [J].

Chhowalla, M ;

Alexandrou, I ;

Kiely, C ;

Amaratunga, GAJ ;

Aharonov, R ;

Fontana, RF .

THIN SOLID FILMS, 1996, 290 :103-106

[9]

Dennison JR, 1996, SPECTROSCOPY-US, V11, P38

[10]

Dluzniewski M, 1996, ADV MATER OPT ELECTR, V6, P409, DOI 10.1002/(SICI)1099-0712(199609)6:5/6<409::AID-AMO252>3.0.CO

← 1 2 3 4 5 6 7 8 →