Investigation of carbon nitride films by cathodic arc evaporation

被引：34

作者：

Chhowalla, M ^{[1
]}

Alexandrou, I ^{[1
]}

Kiely, C ^{[1
]}

Amaratunga, GAJ ^{[1
]}

Aharonov, R ^{[1
]}

Fontana, RF ^{[1
]}

机构：

[1] MULTIARC INC, ROCKAWAY, NJ 07866 USA

来源：

THIN SOLID FILMS | 1996年 / 290卷

关键词：

cathodic arcs; carbon nitride films;

D O I：

10.1016/S0040-6090(96)09067-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Presently there is great interest in deposition of the beta-phase C3N4 because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon are in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CNx films deposited above room temperature and 1 mTorr (0.013 Pa) of N-2 were found to have low stress, indicating the presence of mostly sp(2) bonding.

引用

收藏

页码：103 / 106

页数：4

相关论文

共 16 条

[1] INTRINSIC TOUGHNESS OF INTERFACES [J].

ARGON, AS ;

GUPTA, V ;

LANDIS, HS ;

CORNIE, JA .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1989, 107 :41-47

[2] SYMMETRY-BREAKING IN NITROGEN-DOPED AMORPHOUS-CARBON - INFRARED OBSERVATION OF THE RAMAN-ACTIVE G-BANDS AND D-BANDS [J].

KAUFMAN, JH ;

METIN, S ;

SAPERSTEIN, DD .

PHYSICAL REVIEW B, 1989, 39 (18) :13053-13060

[3]

LIFSHITZ Y, 1994, PHYS REV LETT, V72, P1396

[4] PREDICTION OF NEW LOW COMPRESSIBILITY SOLIDS [J].

LIU, AY ;

COHEN, ML .

SCIENCE, 1989, 245 (4920) :841-842

[5] CARBON NITRIDE DEPOSITED USING ENERGETIC SPECIES - A 2-PHASE SYSTEM [J].

MARTON, D ;

BOYD, KJ ;

ALBAYATI, AH ;

TODOROV, SS ;

RABALAIS, JW .

PHYSICAL REVIEW LETTERS, 1994, 73 (01) :118-121

[6] COMPRESSIVE-STRESS-INDUCED FORMATION OF THIN-FILM TETRAHEDRAL AMORPHOUS-CARBON [J].

MCKENZIE, DR ;

MULLER, D ;

PAILTHORPE, BA .

PHYSICAL REVIEW LETTERS, 1991, 67 (06) :773-776

[7] STRUCTURAL-PROPERTIES OF AMORPHOUS-CARBON NITRIDE FILMS PREPARED BY REACTIVE RF-MAGNETRON SPUTTERING [J].

NAKAYAMA, N ;

TSUCHIYA, Y ;

TAMADA, S ;

KOSUGE, K ;

NAGATA, S ;

TAKAHIRO, K ;

YAMAGUCHI, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (10A) :L1465-L1468

[8] EXPERIMENTAL REALIZATION OF THE COVALENT SOLID CARBON NITRIDE [J].

NIU, CM ;

LU, YZ ;

LIEBER, CM .

SCIENCE, 1993, 261 (5119) :334-337

[9] NITROGEN DOPING OF TETRAHEDRAL AMORPHOUS-CARBON [J].

ROBERTSON, J ;

DAVIS, CA .

DIAMOND AND RELATED MATERIALS, 1995, 4 (04) :441-444

[10] REACTIVE MAGNETRON SPUTTER-DEPOSITION OF CNX FILMS ON SI(001) SUBSTRATES - FILM GROWTH, MICROSTRUCTURE AND MECHANICAL-PROPERTIES [J].

SJOSTROM, H ;

IVANOV, I ;

JOHANSSON, M ;

HULTMAN, L ;

SUNDGREN, JE ;

HAINSWORTH, SV ;

PAGE, TF ;

WALLENBERG, LR .

THIN SOLID FILMS, 1994, 246 (1-2) :103-109