Piezoelectric coefficient of GaN measured by laser interferometry

被引:28
作者
Leung, CM [1 ]
Chan, HLW
Surya, C
Fong, WK
Choy, CL
Chow, P
Rosamund, M
机构
[1] Hong Kong Polytech Univ, Dept Appl Phys, Mat Res Ctr, Hong Kong, Peoples R China
[2] Hong Kong Polytech Univ, Dept Elect Engn, Hong Kong, Peoples R China
[3] SVT Associates Inc, Eden Prairie, MN USA
关键词
D O I
10.1016/S0022-3093(99)00383-X
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A Mach-Zehnder type heterodyne interferometer was used to measure the d(33) coefficient of wurtzite gallium nitride (GaN) films. The 140 nm thick GaN film, with a 30 nm thick aluminum nitride (AlN) buffer layer, had been grown by molecular beam epitaxy (MBE) on (1 0 0) or (1 1 1) silicon substrates. The measurement of the piezoelectric coefficient was made with a spatial resolution (laser beam diameter) of 100 mu m. Voltage drop across the aluminum nitride buffer layer was estimated and used in calculating the piezoelectric coefficient of GaN. For rigidly mounted samples, the measured d(33) was 2.13 pm/V. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:123 / 127
页数:5
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