In situ x-ray scattering study of PbTiO3 chemical-vapor deposition

被引：32

作者：

Murty, MVR

Streiffer, SK

Stephenson, GB

Eastman, JA

Bai, GR

Munkholm, A

Auciello, O

Thompson, C

机构：

[1] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

[2] No Illinois Univ, Dept Phys, De Kalb, IL 60115 USA

来源：

APPLIED PHYSICS LETTERS | 2002年 / 80卷 / 10期

关键词：

D O I：

10.1063/1.1458530

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present in situ surface x-ray scattering measurements of PbTiO3 epitaxy by metal-organic chemical-vapor deposition. Oscillations in crystal truncation rod intensity corresponding to layer-by-layer growth are observed under a variety of growth conditions. At lower PbO overpressures, we observe a transition to step-flow growth and an increased rate of recovery after growth, indicating a higher surface mobility. (C) 2002 American Institute of Physics.

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页码：1809 / 1811

页数：3

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