Flexible substrate micro-crystalline silicon and gated amorphous silicon strain sensors

被引:59
作者
Zhou, LS [1 ]
Jung, SY
Brandon, E
Jackson, TN
机构
[1] Penn State Univ, Dept Elect Engn, Ctr Thin Film Devices, University Pk, PA 16802 USA
[2] Penn State Univ, Dept Elect Engn, Mat Res Inst, University Pk, PA 16802 USA
[3] CALTECH, Jet Prop Lab, NASA, Pasadena, CA 91109 USA
关键词
flexible electronics; strain sensors; semiconductor devices; strain measurement; thin films; thin-film transistors (TFTs);
D O I
10.1109/TED.2005.861727
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present two different kinds of semiconductor strain sensors: ungated n+ micro-crystalline silicon (n + mu C-Si), and gated hydrogenated amorphous silicon (a-Si:H). Both sensor types are fabricated on flexible polyimide substrates. The sensors were characterized with bending perpendicular, parallel, and at 450 with respect to the sensor bias direction, and for several bending diameters. Sensor size and power consumption are significantly reduced compared to metallic foil strain sensors. Small sensor size and ease of integration with a-Si:H thin-film transistors also allows arrays of strain sensors or combinations of strain sensors with varying geometric orientation to allow strain direction as well as magnitude to be unambiguously determined. Index Terms-Flexible electronics, strain sensors, semiconductor devices, strain measurement, thin films, thin-film transistors (TFTs).
引用
收藏
页码:380 / 385
页数:6
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