Tri-layer a-Si:H integrated circuits on polymeric substrates

被引:25
作者
Thomasson, DB [1 ]
Bonse, M [1 ]
Huang, JR [1 ]
Wronski, CR [1 ]
Jackson, TN [1 ]
机构
[1] Penn State Univ, Dept Elect Engn, Elect Mat & Proc Lab, University Pk, PA 16802 USA
来源
INTERNATIONAL ELECTRON DEVICES MEETING 1998 - TECHNICAL DIGEST | 1998年
关键词
D O I
10.1109/IEDM.1998.746348
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using a thermal mountant, we have fabricated hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) and integrated circuits on both colored and nearly colorless polyimide substrates with performance very similar to devices fabricated on glass substrates. Delay and power dissipation were measured with ring oscillators; minimum stage delay was less than 10 mu sec, and minimum power dissipation was less than 10 mu W per stage. These results indicate that with suitable thermal engineering, a-Si:H devices and circuits can be fabricated on polymeric substrates using nearly standard processing.
引用
收藏
页码:253 / 256
页数:4
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