X-ray transmission lenses by deep x-ray lithography and LIGA technique: First results and fundamental limits.

被引:13
作者
Kupka, RK [1 ]
Bouamrane, F [1 ]
Roulliay, M [1 ]
Megtert, S [1 ]
机构
[1] Univ Paris Sud, Utilisat Rayonnement Electromagnet Lab, F-91405 Orsay, France
来源
DESIGN, TEST, AND MICROFABRICATION OF MEMS AND MOEMS, PTS 1 AND 2 | 1999年 / 3680卷
关键词
LIGA; micro-optics; deep x-ray lithography; high aspect ratios; transmission lenses; x-ray lenses; beryllium growth; lithium growth; anomalous dispersion; EPON SU-8;
D O I
10.1117/12.341240
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Today's dimensionality of microtechnology enables the fabrication of precise objects, like diffraction limited x-ray transmission optics. Based on deep x-ray/LIGA technology, first results are presented concerning the fabrication and modelling of parabolic and massive-serial focalizing x-ray transmission lenses in PMMA, as opposed to standard grazing incidence reflection optics. The theoretical performance limitations of such optical systems are derived and stem from fundamental physical properties like the anomalous dispersion properties of the used materials. Parabolic x-ray transmission lenses are limited to very small numerical apertures, but behave optically like any ideal transmission lens would do. The advantages of deep x-ray LIGA technology are its favorable surface roughness and inherent precision. Unlike silicon micromachining, LIGA technique profits from a larger choice of possible materials. The importance of low-Z compounds like Lithium or Be / B is pointed out together with necessary new techniques in the framework of LIGA, like electroplating from organic solutions.
引用
收藏
页码:508 / 517
页数:10
相关论文
共 20 条
[1]  
ANGELO RW, 1992, Patent No. 5102772
[2]  
[Anonymous], SPRINGER SERIES OPTI
[3]  
BERGER MJ, INTERNET BASED COMPI
[4]  
Brenner A., 1971, T I MET FINISH, V49, P71, DOI DOI 10.1080/00202967.1971.11870170
[5]   DEEP X-RAY-LITHOGRAPHY FOR THE PRODUCTION OF 3-DIMENSIONAL MICROSTRUCTURES FROM METALS, POLYMERS AND CERAMICS [J].
EHRFELD, W ;
LEHR, H .
RADIATION PHYSICS AND CHEMISTRY, 1995, 45 (03) :349-365
[6]  
HENKE BL, 1993, ATOM DATA NUCL DATA, V54, P2
[7]   ELECTRODEPOSITION FROM ORGANIC SOLUTIONS OF METALS THAT ARE DIFFICULT TO DEPOSIT FROM AQUEOUS-SOLUTIONS [J].
JAYAKRISHNAN, S ;
PUSHPAVANAM, M ;
SHENOI, BA .
SURFACE TECHNOLOGY, 1981, 13 (03) :225-240
[8]   ELASTIC-SCATTERING OF GAMMA-RAYS AND X-RAYS BY ATOMS [J].
KANE, PP ;
KISSEL, L ;
PRATT, RH ;
ROY, SC .
PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS, 1986, 140 (02) :75-159
[9]   THE VALIDITY OF FORM-FACTOR, MODIFIED-FORM-FACTOR AND ANOMALOUS-SCATTERING-FACTOR APPROXIMATIONS IN ELASTIC-SCATTERING CALCULATIONS [J].
KISSEL, L ;
ZHOU, B ;
ROY, SC ;
SENGUPTA, SK ;
PRATT, RH .
ACTA CRYSTALLOGRAPHICA SECTION A, 1995, 51 :271-288
[10]   Transparent masks for aligned deep x-ray lithography/LIGA: low-cost well-performing alternative using glass membranes [J].
Kupka, PK ;
Megtert, S ;
Roulliay, M ;
Bouamrane, F .
MATERIALS AND DEVICE CHARACTERIZATION IN MICROMACHINING, 1998, 3512 :271-276