Investigation of electrochromic properties of nanocrystalline tungsten oxide thin film

被引：77

作者：

Meda, L

Breitkopf, RC

Haas, TE

Kirss, RU

机构：

[1] Northeastern Univ, Dept Chem, Boston, MA 02115 USA

[2] Tufts Univ, WK Keck Mat Chem Lab, Dept Chem, Medford, MA 02155 USA

来源：

THIN SOLID FILMS | 2002年 / 402卷 / 1-2期

基金：

美国国家航空航天局;

关键词：

electrochromism; tungsten oxide; chemical vapor deposition (CVD); nanocrystalline;

D O I：

10.1016/S0040-6090(01)01598-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of tungsten oxide were grown by organometallic chemical vapor deposition (OMCVD) using tetra(allyl)tungsten, W(eta(3)-C3H5)(4). X-Ray diffraction (XRD) analyses showed amorphous films at substrate temperatures (T-s) <350degreesC and polycrystalline films at T-s>350degreesC. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) revealed grain sizes in the range 20-40 nm. In situ electrochemical reduction of WO3,2/ITO (2.0 M HCl) produced a faint blue color in less than 1 s. The maximum coloration efficiency (CE) was found to be 22 cm(2)/mC at 630 nm. The density of the films decreases from 4.53 to 4.29 g/cm(3) after annealing. An optical bandgap (E-g) of similar to3.2 eV was estimated for both as-deposited and annealed films. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：126 / 130

页数：5

共 27 条

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