Effect of incident angle in spectral ellipsometry on composition control during molecular beam epitaxial growth of HgCdTe

被引:6
作者
Aqariden, F
Duncan, WM
Shih, HD
Almeida, LA
Bevan, MJ
机构
[1] DRS Infrared Technol LP, Dallas, TX 75374 USA
[2] Univ Illinois, Microphys Lab, Chicago, IL 60607 USA
[3] Texas Instruments Inc, Digital Imaging Technol Dev, Plano, TX 75086 USA
[4] E OIR Measurement Inc, Spotsylvania, VA 22553 USA
[5] Texas Instruments Inc, Silicon Technol Dev, Dallas, TX 75265 USA
关键词
HgCdTe; in-situ growth; molecular beam epitaxy (MBE); spectroscopic ellipsometry;
D O I
10.1007/s11664-999-0066-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effect of incident angle in spectral ellipsometry (SE) on composition control of Hg1-xCdxTe grown by molecular beam epitaxy (MBE) was investigated. Although a small uncertainty in the incident angle tends to have a significant impact on the ellipsometric data, and therefore the composition data, it was found that the incident angle uncertainty could be corrected in the SE model calculation, resulting in an "optimized" incident angle that would give the best fit between measured and calculated ellipsometric data. Experimental data supporting this simple corrective or optimization procedure for the incident angle are presented.
引用
收藏
页码:756 / 759
页数:4
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