Simulation of the 'brittle-ductile transition in silicon single crystals using dislocation mechanics' - Comment

被引:3
作者
Hirsch, PB
Roberts, SG
机构
[1] Univ of Oxford, Oxford
关键词
D O I
10.1016/S1359-6462(97)00376-X
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Y.B. Xin and H.J. Hsia modeled the brittle-ductile transition in silicon single crystals by symmetric emission of edge dislocations at a crack tip in {110}〈110〉 oriented specimens on slip planes passing through the crack tip and normal to the cleavage plane. They took into account the dislocation/dislocation interactions only between dislocations on one side of the crack plane. P.B. Hirsch and S.G. Roberts' comments on Xin and Hsia's paper on the simulation of the brittle-ductile transition in silicon single crystals using dislocation mechanics are presented.
引用
收藏
页码:1901 / 1903
页数:3
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