High-k dielectric nanofilms fabricated from Titania nanosheets

被引：198

作者：

Osada, M

Ebina, Y

Funakubo, H

Yokoyama, S

Kiguchi, T

Takada, K

Sasaki, T

机构：

[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan

[2] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Midori Ku, Yokohama, Kanagawa 2268502, Japan

[3] Tokyo Inst Technol, Ctr Adv Mat Anal, Meguro Ku, Tokyo 1528550, Japan

[4] Japan Sci & Technol Agcy, Kawaguchi, Saitama 3320012, Japan

来源：

ADVANCED MATERIALS | 2006年 / 18卷 / 08期

关键词：

D O I：

10.1002/adma.200501224

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

2D titania nanosheets are attractive candidates as insulating materials for high-h dielectrics. Solution-based layer-by-layer deposition combined with an atomically flat SrRuO3 electrode produces atomically uniform multilayer nanofilms. These nanofilms exhibit high relative dielectric constants (er) of approximately 125, even for thicknesses down to 10 nm, in contrast to size-induced degradation typical in high-kappa,: materials (see figure).

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页码：1023 / +

页数：6

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