Adsorption structure of 1,4-cyclohexadiene on Si(001)

被引:20
作者
Cho, JH [1 ]
Oh, DH
Kim, KS
Kleinman, L
机构
[1] Univ Texas, Dept Phys, Austin, TX 78712 USA
[2] Pohang Univ Sci & Technol, Dept Chem, Ctr Superfunct Mat, Pohang 790784, South Korea
关键词
D O I
10.1063/1.1448293
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of 1,4-cyclohexadiene on the Si(001) surface is studied by first-principles density-functional calculations within the generalized gradient approximation. The "pedestal" structure where the two C==C double bonds react with different Si dimers is found to be more stable than the "upright" structure where only one of the two C==C bonds reacts with a Si dimer. However, the [2+2] cycloaddition reaction can easily form the upright structure but not the pedestal one. The latter structure can be obtained from the former through a high energy barrier of similar to0.95 eV, indicating a small reaction rate at room temperature. Our results provide the theoretical basis for the interpretation of recent low-energy electron diffraction and photoelectron spectroscopy data in which the upright structure was seen. (C) 2002 American Institute of Physics.
引用
收藏
页码:3800 / 3804
页数:5
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