On the structure of argon assisted amorphous carbon films

被引：33

作者：

Lacerda, RG ^{[1
]}

Hammer, P

Freire, FL

Alvarez, F

Marques, FC

机构：

[1] Univ Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083970 Campinas, SP, Brazil

[2] Pontificia Univ Catolica Rio de Janeiro, Dept Fis, BR-22453970 Rio De Janeiro, Brazil

来源：

基金：

巴西圣保罗研究基金会;

关键词：

amorphous carbon; high compressive stress; subimplantation model;

D O I：

10.1016/S0925-9635(99)00326-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report a study of amorphous carbon films prepared by ion beam assisted deposition (IBAD). X-ray and ultraviolet photoelectron spectroscopy were used for probing the photoelectron core level and valence band of the films, respectively. Raman spectra, stress, and film density were also determined. The intrinsic compressive stress and plasmon energy increase sharply for argon assisting energies up to 100 eV, and vary slightly for energy in the 100 eV to 650 eV range. The highest stress (> 10 GPa) and plasmon energy (29.5 eV), achieved at about 400 eV argon assisting energy, are of the same order as those reported for highly tetrahedral amorphous carbon films. However, structural investigations indicate that the material is composed of a highly compressed and dense sp(2) network. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：796 / 800

页数：5

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