Ferroelectric polarization-leakage current relation in high quality epitaxial Pb(Zr, Ti)O3 films

被引:229
作者
Pintilie, L.
Vrejoiu, I.
Hesse, D.
LeRhun, G.
Alexe, M.
机构
[1] NIMP, Bucharest 077125, Magurele, Romania
[2] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany
来源
PHYSICAL REVIEW B | 2007年 / 75卷 / 10期
关键词
D O I
10.1103/PhysRevB.75.104103
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Leakage current measurements were performed on epitaxial, single-crystal quality Pb(Zr,Ti)O-3 films with thicknesses in the 50-300 nm range. It was found that the voltage behavior of the leakage current has a minor dependence on thickness, which rules out the space-charge limited currents as main leakage source. Temperature-dependent measurements were performed to obtain more information on the transport mechanism through the metal-ferroelectric-metal (MFM) structure. The results are analyzed in the frame of interface-controlled Schottky emission. A surprisingly low value of only 0.12-0.13 eV was obtained for the potential barrier, which is much smaller than the reported value of 0.87 eV [I. Stolichnov , Appl. Phys. Lett. 75, 1790 (1999)]. The result is explained by the effect of the ferroelectric polarization on the potential barrier height. The low value of the effective Richardson constant, of the order of 10(-7)-10(-6) A/cm(2) K-2, suggests that the pure thermionic emission is not the adequate conduction mechanism for epitaxial MFM structures. The true mechanism might be interface-controlled injection, followed by a low mobility drift through the film volume.
引用
收藏
页数:14
相关论文
共 65 条
  • [1] Point defect chemistry of metal oxide heterostructures
    Aggarwal, S
    Ramesh, R
    [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1998, 28 : 463 - 499
  • [2] Can interface dislocations degrade ferroelectric properties?
    Alpay, SP
    Misirlioglu, IB
    Nagarajan, V
    Ramesh, R
    [J]. APPLIED PHYSICS LETTERS, 2004, 85 (11) : 2044 - 2046
  • [3] CONTACT CURRENTS IN SILICON-NITRIDE
    ARNETT, PC
    DIMARIA, DJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (05) : 2092 - 2097
  • [4] Investigation of the importance of interface and bulk limited transport mechanisms on the leakage current of high dielectric constant thin film capacitors
    Baniecki, JD
    Shioga, T
    Kurihara, K
    Kamehara, N
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 94 (10) : 6741 - 6748
  • [5] A model for multistep trap-assisted tunneling in thin high-k dielectrics -: art. no. 044107
    Blank, O
    Reisinger, H
    Stengl, R
    Gutsche, M
    Wiest, F
    Capodieci, V
    Schulze, J
    Eisele, I
    [J]. JOURNAL OF APPLIED PHYSICS, 2005, 97 (04)
  • [6] Competition between ferroelectric and semiconductor properties in Pb(Zr0.65Ti0.35)O3 thin films deposited by sol-gel
    Boerasu, I
    Pintilie, L
    Pereira, M
    Vasilevskiy, MI
    Gomes, MJM
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 93 (08) : 4776 - 4783
  • [7] Brauenlich P., 1979, THERMALLY STIMULATED
  • [8] Dielectric properties in heteroepitaxial Ba0.6Sr0.4TiO3 thin films:: Effect of internal stresses and dislocation-type defects
    Canedy, CL
    Li, H
    Alpay, SP
    Salamanca-Riba, L
    Roytburd, AL
    Ramesh, R
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (11) : 1695 - 1697
  • [9] Thickness and dielectric constant of dead layer in Pt/(Ba0.7Sr0.3)TiO3/YBa2Cu3O7-x capacitor
    Chen, B
    Yang, H
    Zhao, L
    Miao, J
    Xu, B
    Qiu, XG
    Zhao, BR
    Qi, XY
    Duan, XF
    [J]. APPLIED PHYSICS LETTERS, 2004, 84 (04) : 583 - 585
  • [10] Thickness of the near-interface regions and central bulk ohmic resistivity in lead lanthanum zirconate titanate ferroelectric thin films
    Chu, DP
    Zhang, ZG
    Migliorato, P
    McGregor, BM
    Ohashi, K
    Hasegawa, K
    Shimoda, T
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (27) : 5204 - 5206