Microvisualization of structural features and ion electroinsertion behavior of patterned WO3 thin films via integrated optical and atomic force microscopies

被引:14
作者
Stevenson, KJ [1 ]
Hupp, JT [1 ]
机构
[1] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
关键词
D O I
10.1149/1.1390882
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A new approach for the study of electroinsertion of ions into thin films is presented which utilizes a combination of optical (epi fluorescence) and atomic force microscopies, along with electrochemical techniques. We demonstrate that differential ion/charge transfer reactivity can be temporally and spatially imaged and subsequently correlated with structural characteristics. (C) 1999 The Electrochemical Society. S1099-0062(99)05-070-1. All rights reserved.
引用
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页码:497 / 500
页数:4
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