Structural analysis of a carbon nitride film prepared by ion-beam-assisted deposition

被引：7

作者：

Hayashi, T ^{[1
]}

Matsumuro, A

Muramatsu, M

Kohzaki, M

Takahashi, Y

Yamaguchi, K

机构：

[1] Nagoya Univ, Dept Mech Engn, Aichi 4648603, Japan

[2] Mie Univ, Dept Mech Engn, Tsu, Mie 5148507, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1999年 / 38卷 / 4A期

关键词：

carbon nitride; ion-beam-assisted deposition; structural analysis; microstructure; transmission electron microscopy; transmission electron diffraction;

D O I：

10.1143/JJAP.38.L395

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The microstructure of a carbon nitride (CNx) film formed by ion-beam-assisted deposition (IBAD) was investigated by transmission electron microscopy (TEM). This film was formed on the Si (100) substrate by IBAD with an N/C transport ratio of 1. Three different spacings (0.34 nm, 0.21 nm, 0.12 nm) were observed by transmission electron diffraction (TED) and the periodic structure corresponding to the spacing of 0.34 nm was aligned perpendicular to the substrate. The bending of this plane resembled a carbon nanotube; therefore, it seemed reasonable to suppose that the CNx film obtained consisted of numerous carbon-nanotube-like structural elements grown vertically: relative to the substrate, and it also seemed appropriate that these structural elements should be termed nanotube-like carbon nitride.

引用

页码：L395 / L397

页数：3

共 22 条

[1] ANALYTICAL ELECTRON-MICROSCOPY AND RAMAN-SPECTROSCOPY STUDIES OF CARBON NITRIDE THIN-FILMS [J].