N2 gas absorption in cathodic arc apparatus with an Al cathode under medium vacuum

被引：8

作者：

Takikawa, H ^{[1
]}

Kawakami, N ^{[1
]}

Sakakibara, T ^{[1
]}

机构：

[1] Toyohashi Univ Technol, Aichi 4418580, Japan

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1999年 / 27卷 / 04期

关键词：

A1 evaporation rate; A1N film; N-2 gas absorption rate; pressure dependence; reactive cathodic vacuum arc;

D O I：

10.1109/27.782277

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Al evaporation and N-2 absorption rates during cathodic are evaporation with an Al cathode and N-2 gas how were measured as a function of process pressure under medium pressure, These rates decreased as the pressure increased, The ratio of the Al evaporation rate to the N-2 absorption rate was about 2:1, The film deposited on the anode chamber was analyzed by an X-ray diffraction analyzer and found to be aluminum nitride (AIN), This result indicates that N-2 gas is mostly absorbed and fixed in the deposits on the anode surface in the form of AIN.

引用

页码：1034 / 1038

页数：5

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