Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage to the surface with respect to a conducting cantilever under ambient conditions. Following the anodization, patterned areas were selectively modified by chemical etching and coating with different molecules. The alkyl monolayers showed high resistance against chemical etching and protected Si surfaces from oxidation. AFM lithography of monolayers on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on the Si-C covalent bond. (C) 2002 American Institute of Physics.
机构:
Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, JapanNagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan
Sugimura, H
Takai, O
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机构:Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan
Takai, O
Nakagiri, N
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机构:Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan
机构:
Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, JapanNagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan
Sugimura, H
Takai, O
论文数: 0引用数: 0
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机构:Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan
Takai, O
Nakagiri, N
论文数: 0引用数: 0
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机构:Nagoya Univ, Grad Sch Engn, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan