Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films

被引：17

作者：

Solayappan, N ^{[1
]}

McMillan, LD ^{[1
]}

DeAraujo, CAP ^{[1
]}

Grant, B ^{[1
]}

机构：

[1] SUBMICRON SYST CORP,ALLENTOWN,PA 18106

来源：

INTEGRATED FERROELECTRICS | 1997年 / 18卷 / 1-4期

关键词：

chemical solution deposition; thin films; SBT; LSMCD;

D O I：

10.1080/10584589708221693

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper discusses the second generation liquid source misted chemical deposition (LSMCD) technology currently being developed for ferroelectric thin film deposition. A SubMicron Systems (SMS) Model Primaxx-2F cluster tool was used to deposit the films. The developments that have been made since the first generation machine are discussed. The process chamber schematics along with the characteristics of the aerosol generator are explained in detail. The electrical properties obtained from the films deposited by the tool are found to be similar to that of spin-on films. The step coverage obtained on patterned wafers are also shown. The LSMCD technique combines the advantages of spin-on such as simplicity, good stoichiometry control and superior electrical properties with the advantages of CVD such as superior step coverage, manufacturability, etc.

引用

页码：127 / 136

页数：10

共 5 条

[1]

AMI T, 1997, IN PRESS P 9 INT S I

[2] Liquid source misted chemical deposition (LSMCD) - A critical review [J].