Waveguide shaping and writing in fused silica using a femtosecond laser

被引：31

作者：

Liu, JR ^{[1
]}

Zhang, ZY ^{[1
]}

Flueraru, C ^{[1
]}

Liu, XP ^{[1
]}

Chang, SD ^{[1
]}

Grover, CP ^{[1
]}

机构：

[1] Natl Res Council Canada, Inst Natl Measurement Stand, Ottawa, ON K1A 0R6, Canada

来源：

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2004年 / 10卷 / 01期

关键词：

dielectric modification; femtosecond laser; insertion loss;

D O I：

10.1109/JSTQE.2003.822945

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 [电气工程]; 0809 [电子科学与技术];

摘要：

Fused silica waveguides were written and reshaped with an 800-nm amplified femtosecond laser in a lateral writing configuration. The asymmetry of the waveguide shape and the index profile was partially corrected through multiple scans shifted by 1 or 2 mum. Following the careful adjustment of both laser pulse energy and writing speed, the resulting waveguides exhibited substantial reduction in propagation and coupling losses by more than 50% in the C-band.

引用

页码：169 / 173

页数：5

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