Influence of substrate texture on microstructure and photovoltaic performances of thin film polycrystalline silicon solar cells

被引：59

作者：

Matsui, T ^{[1
]}

Tsukiji, M ^{[1
]}

Saika, H ^{[1
]}

Toyama, T ^{[1
]}

Okamoto, H ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn Sci, Dept Phys Sci, Toyonaka, Osaka 5608531, Japan

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2002年 / 299卷

关键词：

D O I：

10.1016/S0022-3093(01)01083-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin film polycrystalline silicon (poly-Si) solar cells have been fabricated by plasma enhanced chemical vapor deposition on differently textured ZnO/Ag/SnO2/glass substrates. Using a textured substrate with the root mean square (RMS) roughness (sigma) of 38 nm. the conversion efficiency of 8.22% has been achieved due to improvement of long wavelength responses. Whereas using textured substrates with sigma > 38 nm. (220) preferential growth is deteriorated, yielding decreases in both short circuit current and open circuit voltage. The field-dependent carrier collection behaviors reveal that the carrier diffusion length in the poly-Si layer on textured substrates with sigma > 38 nm decreases due to the change in poly-Si microstructure. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：1152 / 1156

页数：5

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