Vapor-Phase Metalation by Atomic Layer Deposition in a Metal-Organic Framework

被引:838
作者
Mondloch, Joseph E. [1 ]
Bury, Wojciech [1 ,2 ]
Fairen-Jimenez, David [1 ]
Kwon, Stephanie [1 ]
DeMarco, Erica J. [1 ]
Weston, Mitchell H. [1 ]
Sarjeant, Amy A. [1 ]
Nguyen, SonBinh T. [1 ]
Stair, Peter C. [1 ]
Snurr, Randall Q. [1 ]
Farha, Omar K. [1 ]
Hupp, Joseph T. [1 ]
机构
[1] Northwestern Univ, Dept Chem & Chem & Biol Engn, Evanston, IL 60208 USA
[2] Warsaw Univ Technol, Dept Chem, PL-00664 Warsaw, Poland
关键词
D O I
10.1021/ja4050828
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Metal-organic frameworks (MOFs) have received attention for a myriad of potential applications including catalysis, gas storage, and gas separation. Coordinatively unsaturated metal ions often enable key functional behavior of these materials. Most commonly, MOFs have been metalated from the condensed phase (i.e., from solution). Here we introduce a new synthetic strategy capable of metallating MOFs from the gas phase: atomic layer deposition (ALD). Key to enabling metalation by AID In MOFs (AIM) was the synthesis of NU-1000, a new, thermally stable, Zr-based MOP with spatially oriented -OH groups and large 1D mesopores and apertures.
引用
收藏
页码:10294 / 10297
页数:4
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