Physics and chemistry of plasma pollution control technology

被引:65
作者
Chang, J. S. [1 ,2 ]
机构
[1] McMaster Univ, McMaster Inst Appl Radiat Sci, Hamilton, ON L8S 4M1, Canada
[2] McMaster Univ, Dept Engn Phys, Hamilton, ON L8S 4M1, Canada
关键词
D O I
10.1088/0963-0252/17/4/045004
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Gaseous pollution control technologies for acid gases (NOx, SOx, etc), volatile organic compounds, greenhouse gases, ozone layer depleting substances, etc have been commercialized based on catalysis, incineration and adsorption methods. However, non-thermal plasma techniques based on electron beams and corona discharges are becoming significant due to advantages such as lower costs, higher removal efficiency and smaller space volume. In order to commercialize this new technology, the pollution gas removal rate, energy efficiency of removal, pressure drop of reactors and useable by-product production rates must be improved and identification of major fundamental processes and optimizations of reactor and power supply for an integrated system must be investigated. In this work, the chemistry and physics of plasma pollution control are discussed and the limitation of this type of plasma is outlined based on the plasma parameters.
引用
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页数:6
相关论文
共 33 条
[1]  
BEUTHE T, 1995, HDB ELECTROSTATIC PR, pCH9
[2]  
BEUTHE TG, 1999, JPN J APPL PHYS, V38, P98060
[3]  
Chang JS, 2001, SCI TECHNOL ADV MAT, V2
[5]   Next generation integrated electrostatic gas cleaning systems [J].
Chang, JS .
JOURNAL OF ELECTROSTATICS, 2003, 57 (3-4) :273-291
[6]   Simultaneous removal of NOx and SO2 from coal boiler flue gases by DC corona discharge ammonia radical shower systems:: pilot plant tests [J].
Chang, JS ;
Urashima, K ;
Tong, YX ;
Liu, WP ;
Wei, HY ;
Yang, FM ;
Liu, XJ .
JOURNAL OF ELECTROSTATICS, 2003, 57 (3-4) :313-323
[7]   CORONA DISCHARGE PROCESSES [J].
CHANG, JS ;
LAWLESS, PA ;
YAMAMOTO, T .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (06) :1152-1166
[8]  
Chang JS, 1983, ATOMIC MOL PROCESSES
[9]  
CHANG JS, 2000, OYO BUTSURI, V69, P268
[10]  
CHANG MB, 2006, IND CHEM ENG RES, P46