Nanometer focusing of hard x rays by phase zone plates

被引：203

作者：

Yun, W

Lai, B

Cai, Z

Maser, J

Legnini, D

Gluskin, E

Chen, Z

Krasnoperova, AA

Vladimirsky, Y

Cerrina, F

Di Fabrizio, E

Gentili, M

机构：

[1] Argonne Natl Lab, Expt Facil Div, Argonne, IL 60439 USA

[2] Univ Wisconsin, Dept Elect & Comp Engn, Ctr Xray Lithog, Madison, WI 53706 USA

[3] CNR, Ist Elettron Stato Solido, I-00156 Rome, Italy

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 05期

关键词：

D O I：

10.1063/1.1149744

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Focusing of 8 keV x rays to a spot size of 150 and 90 nm full width at half maximum have been demonstrated at the first- and third-order foci, respectively, of a phase zone plate (PZP). The PZP has a numerical aperture of 1.5 mrad and focusing efficiency of 13% for 8 keV x rays. A flux density gain of 121 000 was obtained at the first-order focus. In this article, the fabrication of the PZP and its experimental characterization are presented and some special applications are discussed. (C) 1999 American Institute of Physics. [S0034-6748(99)02705-7].

引用

页码：2238 / 2241

页数：4

共 17 条

[1]

ANDERSON EH, 1995, J VAC SCI TECHNOL B, V13, P2525

[2] TRANSMISSION GRATINGS THAT DIFFRACT 8-KEV X-RAYS [J].

BIONTA, RM .

APPLIED PHYSICS LETTERS, 1987, 51 (10) :725-727

[3]

Charalambous P, 1995, PROC SPIE, V2516, P2, DOI 10.1117/12.221663

[4]

CHEN ZG, 1998, THESIS U WISCONSIN M

[5] Low-distortion electron-beam lithography for fabrication of high-resolution germanium and tantalum zone plates [J].

David, C ;

Kaulich, B ;

Medenwaldt, R ;

Hettwer, M ;

Fay, N ;

Diehl, M ;

Thieme, J ;

Schmahl, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2762-2766

[6] Fabrication of a hard x-ray sputtered-sliced Fresnel phase zone plate [J].

Kamijo, N ;

Tamura, S ;

Suzuki, Y ;

Handa, K ;

Takeuchi, A ;

Yamamoto, S ;

Ando, M ;

Ohsumi, K ;

Kihara, H .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1997, 68 (01) :14-16

[7]

KAULICH B, 1998, SPIES 43 ANN M SAN D

[8] PHASE ZONE PLATES FOR X-RAYS AND EXTREME UV [J].

KIRZ, J .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (03) :301-309

[9] HARD X-RAY PHASE ZONE PLATE FABRICATED BY LITHOGRAPHIC TECHNIQUES [J].

LAI, B ;

YUN, WB ;

LEGNINI, D ;

XIAO, Y ;

CHRZAS, J ;

VICCARO, PJ ;

WHITE, V ;

BAJIKAR, S ;

DENTON, D ;

CERRINA, F ;

DIFABRIZIO, E ;

GENTILI, M ;

GRELLA, L ;

BACIOCCHI, M .

APPLIED PHYSICS LETTERS, 1992, 61 (16) :1877-1879

[10]

LAI B, IN PRESS

← 1 2 →