Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithography

We investigated the possibilities of Hot Embossing Lithography (HEL) as a novel technique for the replication of nanostructures. A replication fidelity in polymers of less than 10 nm was achieved using anisotropically etched Si-substrates as masters. We demonstrated that nanoimprinting combined with the lift-off technique can be used to fabricate arrays of interdigitated metal electrodes. The electrodes have a length of 100 mu m and a spacing between the electrodes of 200 nm, and are defect-free over an area of 10 mu m x 100 mu m.