Modeling of plume dynamics in laser ablation processes for thin film deposition of materials

被引:46
作者
Leboeuf, JN
Chen, KR
Donato, JM
Geohegan, DB
Liu, CL
Puretzky, AA
Wood, RF
机构
[1] NATL CHANGHUA UNIV EDUC, DEPT PHYS, CHANGHUA, TAIWAN
[2] RUSSIAN ACAD SCI, INST SPECT, TROITSK 142092, RUSSIA
关键词
ABLATION; DEPOSITION; LASER RADIATION; LASER−PRODUCED PLASMA; PLASMA SIMULATION; THIN FILMS; TRANSPORT THEORY;
D O I
10.1063/1.871676
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The transport dynamics of laser-ablated neutral/plasma plumes are of significant interest for film growth by pulsed-laser deposition of materials, since the magnitude and kinetic energy of the species arriving at the deposition substrate are key processing parameters. Dynamical calculations of plume propagation in vacuum and in background gas have been performed using particle-in-cell hydrodynamics, continuum gasdynamics, and scattering models. Results from these calculations are presented and compared with experimental observations. (C) 1996 American Institute of Physics.
引用
收藏
页码:2203 / 2209
页数:7
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