KrF laser deposition combined with magnetron sputtering to grow titanium-carbide layers

被引：13

作者：

Jelínek, M

Kocourek, T

Kadlec, J

Vorlícek, V

Cernansky, M

Studnicka, V

Santoni, A

Bohác, P

Uherek, F

机构：

[1] Acad Sci Czech Republ, Inst Phys, Prague 18221 8, Czech Republic

[2] Mil Acad Brno, Brno, Czech Republic

[3] ENEA, CR Frascati, I-00044 Frascati, Italy

[4] Ctr Int Laser, Bratislava 81219, Slovakia

来源：

THIN SOLID FILMS | 2006年 / 506卷

关键词：

PLD; magnetron sputtering; hybrid deposition; TiC film;

D O I：

10.1016/j.tsf.2005.08.040

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium -carbide films were grown using a magnetron assisted pulse laser deposition combining KrF pulsed laser deposition and DC magnetron sputtering (PLDMS). Plasma streams produced by magnetron and laser ablation were intersected on the substrate surface. Films' properties were characterized by GDOES, AFM, XRD, XPS as well as by Raman spectroscopy. The adhesion and microhardness were also studied. Crystalline TiC films were fabricated at room temperature. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：101 / 105

页数：5

共 19 条

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