Sub-50 nm planar magnetic nanostructures fabricated by ion irradiation

被引：127

作者：

Devolder, T ^{[1
]}

Chappert, C

Chen, Y

Cambril, E

Bernas, H

Jamet, JP

Ferré, J

机构：

[1] Univ Paris Sud, Inst Elect Fondamentale, F-91405 Orsay, France

[2] CNRS, Microstruct & Microelect Lab, F-92220 Bagneux, France

[3] Univ Paris Sud, Ctr Spectrometrie Nucl & Spectrometrie Masse, F-91405 Orsay, France

[4] Univ Paris Sud, Phys Solides Lab, F-91405 Orsay, France

来源：

APPLIED PHYSICS LETTERS | 1999年 / 74卷 / 22期

关键词：

D O I：

10.1063/1.123352

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

He+ ion irradiation of Co-Pt multilayers through a silica mask obtained by a combination of high resolution lithography and reactive ion etching can produce an optical contrast-free, entirely planar, sub-50 nm magnetically patterned array. Furthermore, the specificity of magnetization reversal in such arrays leads to a weak dispersion of coercive forces. The technique holds promise for both present hard disk technology and future near field magneto-optical recording. (C) 1999 American Institute of Physics. [S0003-6951(99)01322-4].

引用

页码：3383 / 3385

页数：3

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