Atomic-scale modeling of double-gate MOSFETs using a tight-binding Green's function formalism

被引:34
作者
Bescond, M [1 ]
Autran, JL [1 ]
Munteanu, D [1 ]
Lannoo, M [1 ]
机构
[1] L2MP, UMR 6137, CNRS, Bat IRPHE, F-13384 Marseille 20, France
关键词
ballistic transport; tight-binding; Green's function formalism; atomic modeling; quantum tunneling; double-gate devices;
D O I
10.1016/j.sse.2003.09.025
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we present an atomic-scale modeling of a single conduction channel double-gate MOSFET based on the self-consistent solving of the two-dimensional Poisson equation with the Schrodinger equation. This later, expressed in tight-binding, is solved using the Green's function formalism in the axial part of the device (i.e. the source-channel-drain region) modeled as a single atomic linear chain and sandwiched between two gate dielectrics treated as perfect insulating media. For device with channel length typically below 10 nm, our results show that source-to-drain tunneling effect and electron reflection in the channel severely impact the device characteristics. Nevertheless, essential field-effect transistor behaviors are preserved, which demonstrates that the operation of double-gate devices can be still considered even at this ultimate limit of a single conduction channel depicted at the atomic-scale. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:567 / 574
页数:8
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