Submicro- and nanostructural eff ects on electrical properties of Li0.2V2O5 thin films obtained by atomic layer deposition (ALD)

Dielectric and conductivity spectra of a Li0.2V2O5 thin film were recorded in a broad frequency range 40-1.1 X 10(8) Hz at temperature varying between 210 and 300 K. The V2O5 thin film (thickness 260 nm) was deposited on titanium substrate by atomic layer deposition (ALD). An annealing process at 500 degrees C in air was required to obtain crystallized V2O5. Li0.2V2O5 were obtained by electrochemical insertion of lithium ions within V2O5 thin film. All the data are presented in the form of complex resistivity and permittivity diagrams which have been analyzed in relation to characterizations with scanning electron microscopy (SEM) and X-ray diffraction (XRD). The Dc-conductivity sigma(Dc) of Li0.2V2O5 film is induced by a surface diffusion of small-polarons on particles (submicrostructure) and crystallites (nanostructure), which constitute the film texture. (c) 2006 Elsevier Ltd. All rights reserved.