Facile method to fabricate a large-scale superhydrophobic surface by galvanic cell reaction

被引：129

作者：

Shi, F

Song, YY

Niu, J

Xia, XH ^{[1
]}

Wang, ZQ

Zhang, X

机构：

[1] Nanjing Univ, Dept Chem, Key Lab Analyt Chem Life Sci, Nanjing 210093, Peoples R China

[2] Tsinghua Univ, Dept Chem, Key Lab Organ Optoelect & Mol Engn, Beijing 100084, Peoples R China

来源：

CHEMISTRY OF MATERIALS | 2006年 / 18卷 / 05期

关键词：

D O I：

10.1021/cm052502n

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This paper describes the use of galvanic cell reaction as a facile method to chemically deposit Ag nanostructures on the p-silicon wafer on a large scale. When the Ag covered silicon wafer is further modified with a self-assembled monolayer of n-dodecanethiol, a superhydrophobic surface can be obtained with a contact angle of about 154 degrees and a tilt angle lower than 5 degrees.

引用

页码：1365 / 1368

页数：4

共 23 条

[1] Purity of the sacred lotus, or escape from contamination in biological surfaces [J].