EUV scattering and flare of 10x projection cameras

被引：35

作者：

Gullikson, EM ^{[1
]}

Baker, S ^{[1
]}

Bjorkholm, JE ^{[1
]}

Bokor, J ^{[1
]}

Goldberg, KA ^{[1
]}

Goldsmith, JEM ^{[1
]}

Montcalm, C ^{[1
]}

Naulleau, P ^{[1
]}

Spiller, E ^{[1
]}

Stearns, DG ^{[1
]}

Taylor, JS ^{[1
]}

Underwood, JH ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2 | 1999年 / 3676卷

关键词：

extreme ultraviolet lithography; flare; light scattering; roughness; power spectral density;

D O I：

10.1117/12.351162

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

Two new Schwarzschild cameras have been fabricated for the extreme ultraviolet (EUV) 10x microstepper. The surface topography of the mirrors was characterized over the full range of spatial frequencies both before and after multilayer coating. EW scattering from the individual mirrors was measured and compared with the surface profilometry. A knife-edge test was used to directly measure the flare of the assembled cameras. The flare measured in this way is in excellent agreement with the contrast of isolated printed lines and with the point spread function of the camera as determined by EUV interferometry. The measured flare of the camera is also in good agreement with the flare calculated from the combined surface profile measurements of the individual mirrors. Consistent with the improvements made in the surface finish of the mirror substrates, a significant reduction in the dare is observed as compared with previously existing cameras.

引用

页码：717 / 723

页数：3

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