Low-temperature-fabricated InGaZnO4 thin film transistors on polyimide clean-room tape

被引:37
作者
Lim, Wantae [1 ]
Douglas, E. A. [1 ]
Kim, S.-H. [1 ]
Norton, D. P. [1 ]
Pearton, S. J. [1 ]
Ren, F. [2 ]
Shen, H. [3 ]
Chang, W. H. [3 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[3] Army Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USA
基金
美国国家科学基金会;
关键词
carrier density; carrier mobility; flexible electronics; gallium compounds; indium compounds; polymers; semiconductor growth; semiconductor thin films; sputter deposition; substrates; ternary semiconductors; thin film transistors; zinc compounds;
D O I
10.1063/1.3054167
中图分类号
O59 [应用物理学];
学科分类号
摘要
Amorphous (alpha-)InGaZnO4 thin film transistors (TFTs) were fabricated on polyimide clean-room tape at low temperature (< 100 degrees C). The alpha-InGaZnO4 films with an n-type carrier concentration of similar to 10(16) cm(-3) were deposited by rf-magnetron sputtering in a mixed ambient of Ar/O-2. The bottom-gate-type TFTs showed good saturation mobility (similar to 5.3 cm(2) V-1 s(-1)), drain current on-to-off ratio of approximately 10(5), threshold voltage of 1.1 V, and subthreshold gate-voltage swing of 0.55 V decade(-1). These results were comparable to those of the same oxide TFTs that we have fabricated on either glass or polyethylene terephthalate substrates. The results demonstrate that even polyimide clean-room tape can be an appropriate substrate for inexpensive-flexible-adhesive-transparent electronic devices.
引用
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页数:3
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