Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application

被引:792
作者
Hosono, Hideo [1 ]
机构
[1] Tokyo Inst Technol, Frontier Collaborat Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
amorphous semiconductors; thin film transistors; band structure; conductivity;
D O I
10.1016/j.jnoncrysol.2006.01.073
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Recently we have reported the room temperature fabrication of transparent and flexible thin film transistors on a polyethylene tereplithalate (PET) film substrate using an ionic amorphous oxide semiconductor (IAOS) in an In2O3-ZnO-Ga2O3 system. These transistors exhibit a field effect mobility of similar to 10 cm(2) (V s)(-1), which is higher by an order of magnitude than those of hydrogenated amorphous Si and pentacene transistors. This article describes a chemical design concept of IAOS, and its unique electron transport properties, and electronic structure, by comparing them with those of conventional amorphous semiconductors. High potential of IAOS for flexible electronics is addressed. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:851 / 858
页数:8
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