Marathon evaluation of optical materials for 157-nm lithography

被引：11

作者：

Liberman, V ^{[1
]}

Rothschild, A ^{[1
]}

Efremow, NN ^{[1
]}

Palmacci, ST ^{[1
]}

Sedlacek, JHC ^{[1
]}

Van Peski, C ^{[1
]}

Orvek, K ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02420 USA

来源：

OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2 | 2001年 / 4346卷

关键词：

D O I：

10.1117/12.435759

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work we present progress on the long-term evaluation of optical materials for 157-nm lithogaphic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in-situ lamp-based cleaning. We review the current status of bulk materials for lenses, such as CaF2 and BaF2, and durability results of antireflectance coatings. Finally, we describe progress on materials testing of organic pellicles, both with 172-nm lamps as well as under 157-nm laser irradiation.

引用

页码：45 / 51

页数：7

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