X-ray reflectivity study of acid-base post-synthesis treatments of mesoporous thin films templated by P123

被引：18

作者：

Bardeau, JF ^{[1
]}

Gourbil, A

Dutreilh-Colas, M

Dourdain, S

Mehdi, A

Gibaud, A

机构：

[1] Univ Maine, CNRS, UMR 6087, Lab Phys Etat Condense, F-72085 Le Mans, France

[2] Univ Montpellier 2, CNRS, UMR 5637, Lab Chim Mol & Org Solide, F-34095 Montpellier, France

来源：

THIN SOLID FILMS | 2006年 / 495卷 / 1-2期

关键词：

mesoporous silica; SBA-15; X-ray reflectivity;

D O I：

10.1016/j.tsf.2005.08.357

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Mesoporous silica thin films have been prepared through evaporation-induced self-assembly in the presence of non-ionic PEO-PPO-PEO surfactants. We investigated the effects of acid-base post-synthesis treatments on the structure of SBA-15 by immersing the samples into diluted HCl or HNO3 solutions at ambient temperature and by exposing them to NH3 atmosphere. The evolution of the 2D hexagonal structure was investigated by X-ray reflectivity (XR) before and after removing the surfactant from the silica matrix. XR curves analyzed were evaluated by the matrix technique to obtain the average electron density of the films, the wall thickness, the electron density of the walls. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：191 / 196

页数：6

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