Extended-source interferometry for at-wavelength test of EUV-optics.

被引：6

作者：

Visser, M ^{[1
]}

Dekker, M ^{[1
]}

Hegeman, P ^{[1
]}

Braat, J ^{[1
]}

机构：

[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2 | 1999年 / 3676卷

关键词：

interferometry; plasma source; extreme ultraviolet lithography;

D O I：

10.1117/12.351096

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

Although EUV-optics can be very accurately tested interferometrically employing a synchrotron (1), testing with a laser-induced or pinch plasma is attractive because of the lower cost of such sources. Within Philips Research a project has started to build an interferometer employing a laser plasma source and a Ronchi-test (2) which is modified in such a way that two-beam interferograms are obtained. We analyze the accuracy, the: vibration and drift sensitivity and the dynamic range of the interferometer for three different combinations of entrance and exit grating by means of computer-generated interferograms. The results are compared with an optical experiment, in which the relevant parameters of the interferometer have been scaled up so that visible light can be used.

引用

页码：253 / 263

页数：3