JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
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1996年
/
35卷
/
4A期
关键词:
microfabrication;
tunnel junctions;
electron beam lithography;
single electron charging effect;
vacuum deposition;
D O I:
10.1143/JJAP.35.2369
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
We have developed a new method for fabrication of microstructures. Using a Si3N4 membrane with small windows as a mask, a metal film with fine structure is vacuum deposited directly onto a substrate. By means of piezoelectric actuators which slide the mask on the substrate, we have fabricated an array of Al/AlOx/Al small tunnel junctions. This method has the important advantage that the lift-off process after vacuum deposition is not necessary. The use of rf plasma oxidation to form the tunnel barrier is another advantage of this method. We have fabricated a Ni/NiO/Fe small junction array with a junction area of 0.01 mu m(2) using plasma oxidation and double-angle evaporation.