Texture formation in titanium nitride films prepared by chemical vapor deposition

The [100], [110], and [211] textured TiN films were obtained in a chemical vapor deposition system using TiCl4, N-2, and H-2 as reaction gases. The microstructure of these textured films was investigated by scanning electron microscopy and transmission electron microscopy. The results show that the [211], [110], and [100] textured films consist of laminated twinned grains, multiply twinned grains, and nearly thermodynamic equilibrium grains respectively at the growing stage. The formation of these textures is discussed based on nucleation and growth mechanisms. At a lower deposition temperature with higher nitrogen concentration, the decahedral multiply twinned and laminated twinned crystals dominate over crystals with single crystalline structure. After competitive growth of these crystals, the multiply twinned crystals with [110] twin axis perpendicular to substrate surface survive. At an intermediate deposition temperature with lower nitrogen concentration, the laminated twinned crystals dominate the growth and the [211] orientation along the (111) twin planes possesses the fastest growth rate and form [211] textured films. At a higher deposition temperature above 1200 degrees C, the single crystalline structure dominates and forms [100] textured films. The effect of surface adsorption on texture formation is discussed. (C) 1996 American Institute of Physics.