Magnetic domain structure in ultrathin Cu/Ni/Cu/Si(001) films

被引：47

作者：

Hug, HJ ^{[1
]}

Stiefel, B ^{[1
]}

Moser, A ^{[1
]}

Parashikov, I ^{[1
]}

Klicznik, A ^{[1
]}

Lipp, D ^{[1
]}

Guntherodt, HJ ^{[1
]}

Bochi, G ^{[1
]}

Paul, DI ^{[1
]}

OHandley, RC ^{[1
]}

机构：

[1] MIT,CAMBRIDGE,MA 02139

来源：

JOURNAL OF APPLIED PHYSICS | 1996年 / 79卷 / 08期

关键词：

D O I：

10.1063/1.362258

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a series of magnetic force microscope (MFM) images of epitaxial magnetic thin films. The films studied, Ni/Cu/Si(001) capped by 2 nm of Cu, exhibit perpendicular anisotropy over an exceptionally broad thickness range, 2 nm<h<14 nm. The magnetic domain structure of the as-grown films shows a sharp transition to a finer length scale above a finite critical thickness of 12 nm. Micromagnetic theory provides the first quantitative description for these general but previously unexplained phenomena. Further we discuss MFM data obtained on films with a thickness larger than 14 nm. These films show a pronounced in-plane anisotropy. (C) 1996 American Institute of Physics.

引用

页码：5609 / 5614

页数：6

共 26 条

[1] MAGNETIZATION DIRECTION SWITCHING IN FE/CU(100) EPITAXIAL-FILMS - TEMPERATURE AND THICKNESS DEPENDENCE [J].