Submicron metal oxide structures by a sol-gel process on patterned substrates

被引：20

作者：

Bechinger, C ^{[1
]}

Muffler, H ^{[1
]}

Schäfle, C ^{[1
]}

Sundberg, O ^{[1
]}

Leiderer, P ^{[1
]}

机构：

[1] Univ Konstanz, D-78457 Constance, Germany

来源：

THIN SOLID FILMS | 2000年 / 366卷 / 1-2期

关键词：

nanostructures; titanium oxide; tungsten oxide; wetting;

D O I：

10.1016/S0040-6090(00)00865-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report about a combination of micro-contact-printing and the sol-gel technique which results in structures in the micron- and submicron range. This technique which is here demonstrated on electrochromic tungsten oxide does not rely on vacuum methods and may therefore be easily upscaled to large areas. (C) 2000 Elsevier Science S.A. All rights reserved.

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收藏

页码：135 / 138

页数：4

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