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Nanoindentation investigation of Ti/TiN multilayers films

被引：84
作者：
Ben Daia, M
Aubert, P
Labdi, S
Sant, C
Sadi, FA
Houdy, P
Bozet, JL
机构：
[1] Univ Evry Val Essonne, Lab Multicouches Nanometr, F-91025 Evry, France
[2] Univ Liege, Serv Elements Machine & Tribol, B-4000 Liege, Belgium
来源：
JOURNAL OF APPLIED PHYSICS | 2000年 / 87卷 / 11期
关键词：
D O I：
10.1063/1.373450
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The hardness of Ti/TiN nanolaminated films is investigated in this study. Monolithic Ti and TiN films and Ti/TiN multilayers were deposited on silicon substrates by radio-frequency sputtering. The period thickness of multilayers was decreased from 20 to 2.5 nm. Grazing x-ray reflectometry showed that the modulation of composition of Ti/TiN multilayers exists for all the period thickness considered. From nanoindentation measurements, we determined the hardness and Young's modulus of multilayers. Hardness increased with decreasing period thickness to go beyond the rule-of-mixture value for samples with period thickness of Lambda less than or equal to 5 nm. The maximum hardness, 1.6 times higher than the value obtained by the rule of mixture, is obtained for Lambda=2.5 nm. Our results are compared to a dislocation-based model previously introduced by Lehoczky. (C) 2000 American Institute of Physics. [S0021-8979(00)09411-1].
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页码：7753 / 7757
页数：5
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