High electron mobility in well ordered and lattice-strained hydrogenated nanocrystalline silicon

被引:21
作者
Chen, XY [1 ]
Shen, WZ [1 ]
Chen, H [1 ]
Zhang, R [1 ]
He, YL [1 ]
机构
[1] Shanghai Jiao Tong Univ, Dept Phys, Lab Condensed Matter Spect & Optoelect Phys, Shanghai 200030, Peoples R China
关键词
D O I
10.1088/0957-4484/17/2/042
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report on the realization of high electron mobility (over 10(3) cm(2) V-1 s(-1)) in structure-ordered and lattice-strained hydrogenated nanocrystalline silicon (nc-Si:H) due to the decrease of conduction effective mass and phonon scattering. The nc-Si:H thin films were grown on crystalline silicon substrates by plasma-enhanced chemical vapour deposition through the radio-frequency power to properly control the chemical reactions of H atoms with the Si-Si network. The electron mobility and concentration in the nc-Si:H have been extracted with the aid of magnetic-field-dependent Hall effect measurements. X-ray diffraction, Raman, and infrared transmission experiments have been employed to yield information about the lattice strain and structural order in the Si nanocrystals. The room-temperature experimental mobility has been well explained by a generalized Drude transport model unifying both the diffusive and ballistic transport mechanisms.
引用
收藏
页码:595 / 599
页数:5
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