Magnetic anisotropy and layer-selective magnetometry of Cu/Co/Ni/Cu/Si (001)

被引：4

作者：

Lauhoff, G

Lee, J

Bland, JAC ^{[1
]}

Langridge, S

Penfold, J

机构：

[1] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England

[2] Yonsei Univ, Dept Phys, Atom Scale Surface Sci Res Ctr, Seoul 120749, South Korea

[3] Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 198-99卷

基金：

英国工程与自然科学研究理事会;

关键词：

magnetic anisotropy; magnetometry; epitaxial structures;

D O I：

10.1016/S0304-8853(98)01131-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Perpendicular magnetic anisotropy (PMA) up to 6.15 +/- 1.25 A Co thickness is found for ferromagnetically coupled epitaxial Co/60 Angstrom Ni/Cu/Si(001)structures. Polarized neutron reflection measurements on a Cu/9 ACo/Ni/Cu(001) structure yield almost bulk like magnetic moments at room-temperature of 1.70 It 0.20 mu(B) and 0.57 +/- 0.05 mu(B), for Co and Ni, respectively. Magneto-optic Kerr effect measurements show that the uniaxial Co volume anisotropy is entirely attributed to the Co shape anisotropy due to an absence of strain in the Co film. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：331 / 333

页数：3