Oxide muonics: I. Modelling the electrical activity of hydrogen in semiconducting oxides

被引:43
作者
Cox, SFJ [1 ]
Lord, JS
Cottrell, SP
Gil, JM
Alberto, HV
Keren, A
Prabhakaran, D
Scheuermann, R
Stoykov, A
机构
[1] Rutherford Appleton Lab, ISIS Facil, Didcot OX11 0QX, Oxon, England
[2] UCL, London WC1E 6BT, England
[3] Univ Coimbra, Dept Phys, P-3004516 Coimbra, Portugal
[4] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
[5] Univ Oxford, Dept Phys, Oxford OX1 3PU, England
[6] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
关键词
D O I
10.1088/0953-8984/18/3/021
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A shallow-to-deep instability of hydrogen defect centres in narrow-gap oxide semiconductors is revealed by a Study of the electronic structure and electrical activity of their muonium counterparts, a methodology that we term 'muonics'. In CdO, Ag2O and Cu2O, paramagnetic muonium centres show varying degrees of delocalization of the Singly Occupied orbital, their hyperfine constants spanning 4 orders Of Magnitude. PbO and RuO2, on the other hand, show only electronically diamagnetic muon states, mimicking those of interstitial protons. Muonium in CdO shows shallow-donor behaviour, dissociating between 50 and 150 K; the effective ionization energy of 0.1 eV is at some variance with the effective-mass model but illustrates the possibility of hydrogen doping inducing n-type conductivity as in the wider-gap oxide, ZnO. For Ag2O, the principal donor level is deeper (0.25 eV) but ionization is nonetheless complete by room temperature. Striking examples of level-crossing and RF resonance spectroscopy reveal a more complex interplay of several metastable states in this case. In Cu2O, muonium has quasi-atomic character and is stable to 600 K, although the electron orbital is Substantially more delocalized than in the trapped-atom states known in certain wide-gap dielectric oxides. Its eventual disappearance towards 900 K, with an effective ionization energy of 1 eV, defines an electrically active level near mid-gap in this material.
引用
收藏
页码:1061 / 1078
页数:18
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